A custom node for ComfyUI, the OcclusionMask offers advanced capabilities for face occlusion, segmentation, and masking, utilizing cutting-edge face detection techniques. It ensures accurate results and flexible workflows, making it a valuable tool for users looking to enhance their image processing tasks.
- Automatic face detection through the insightface FaceAnalysis API for precise localization of facial features.
- Supports various mask types, including Occluder, XSeg, and Object-only, to accommodate different project needs.
- Provides fine control over mask parameters, including threshold adjustments and growth/shrink options, for tailored outputs.
Context
The OcclusionMask custom node is designed to integrate seamlessly into ComfyUI, enhancing the platform's functionality by providing advanced face detection and masking capabilities. Its primary purpose is to allow users to create accurate masks for faces in images, enabling sophisticated image editing and manipulation.
Key Features & Benefits
This tool stands out with its automatic face detection, which employs the insightface buffalo models for high precision in identifying facial features. Users can select from multiple mask types, ensuring that they can tailor their outputs to specific requirements, whether for artistic effects or practical applications. Additionally, the ability to adjust mask parameters provides users with granular control over the final appearance of their images.
Advanced Functionalities
OcclusionMask includes specialized features such as ONNX runtime acceleration, which significantly speeds up the inference process by leveraging optimized models. It can handle various input types, including PIL images and numpy arrays, making it versatile for different workflows. The batch processing capability allows for efficient handling of multiple images simultaneously, streamlining the user's workflow.
Practical Benefits
By incorporating the OcclusionMask node into their ComfyUI setups, users can enhance their image processing workflows, gaining improved control over the quality and accuracy of face masking. This tool not only simplifies the process of creating masks but also boosts efficiency, allowing for quicker project turnaround times.
Credits/Acknowledgments
The development of this tool is credited to ialhabbal, with contributions from various sources, including the ComfyUI framework and insightface models. The project is licensed under the MIT License, encouraging community contributions and collaborative improvements.